RESUMEN
Underwater adhesion processes in nature promise controllable assembly of functional nanoparticles for industrial mass production; However, their artificial strategies have faced challenges to uniformly transfer nanoparticles into a monolayer, particularly those below 100 nm in size, over large areas. Here a scalable "one-shot" self-limiting nanoparticle transfer technique is presented, enabling the efficient transport of nanoparticles from water in microscopic volumes to an entire 2-inch wafer in a remarkably short time of 10 seconds to reach near-maximal surface coverage (≈40%) in a 2D mono-layered fashion. Employing proton engineering in electrostatic assembly accelerates the diffusion of nanoparticles (over 50 µm2/s), resulting in a hundredfold faster coating speed than the previously reported results in the literature. This charge-sensitive process further enables "pick-and-place" nanoparticle patterning at the wafer scale, with large flexibility in surface materials, including flexible metal oxides and 3D-printed polymers. As a result, the fabrication of wafer-scale disordered plasmonic metasurfaces in seconds is successfully demonstrated. These metasurfaces exhibit consistent resonating colors across diverse material and geometrical platforms, showcasing their potential for applications in full-color painting and optical encryption devices.
RESUMEN
Self-limiting assembly of particles represents the state-of-the-art controllability in nanomanufacturing processes where the assembly stops at a designated stage, providing a desirable platform for applications requiring delicate thickness control such as optics, electronics, and catalytic systems. Most successes in self-limiting assembly are limited to self-assembled monolayers (SAMs) of small molecules on inorganic, chemically homogeneous rigid substrates (e.g., Au and SiO2) through surface-interaction mechanisms. Similar mechanisms, however, cannot achieve a uniform assembly of particles on flexible polymer substrates. The complex configurations and conformations of polymer chains create a surface with nonuniform distributions of chemical groups and phases. In addition, most assembly mechanisms require good solvent wettability, where many desirable but hard-to-wet particles and polymer substrates are excluded. Here, we demonstrate a collision-based self-limiting assembly (CSA) to achieve wafer-scale, full-coverage, close-packed monolayers of hydrophobic particles on hydrophobic polymer substrates in aqueous solutions. The kinetic assembly and self-limiting processes are facilitated and controlled by the combined acoustic and shear fields. We envision many applications in functional coatings and showcase their feasibility in structural coloration. Importantly, such functional coatings can be repaired using CSA, and both particles and polymer substrate can be recycled.