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New method of plasma immersion ion implantation and also deposition of industrial components using tubular fixture and plasma generated inside the tube by high voltage pulses.
Ueda, Mario; da Silva, Ataide Ribeiro; Pillaca, Elver J D M; Mariano, Samantha F M; Oliveira, Rogério de Moraes; Rossi, José Osvaldo; Lepienski, Carlos Mauricio; Pichon, Luc.
Afiliação
  • Ueda M; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • da Silva AR; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • Pillaca EJ; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • Mariano SF; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • Oliveira Rde M; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • Rossi JO; Associated Laboratory of Plasma, National Institute for Space Research, São José dos Campos, SP 12227-010, Brazil.
  • Lepienski CM; Department of Physics, Federal University of Paraná, Curitiba, PR 81531990, Brazil.
  • Pichon L; Institut Pprime -UPR 3346 CNRS-Université de Poitiers-ENSMA, Poitiers 86073, France.
Rev Sci Instrum ; 87(1): 013902, 2016 Jan.
Article em En | MEDLINE | ID: mdl-26827328
A new method of Plasma Immersion Ion Implantation (PIII) and deposition (PIII and D) for treating industrial components in the batch mode has been developed. A metal tubular fixture is used to allocate the components inside, around, and along the tube, exposing only the parts of each component that are to be ion implanted to the plasma. Hollow cathode-like plasma is generated only inside the tube filled with the desired gas, by applying high negative voltage pulses to the hollow cylindrical fixture which is insulated from the vacuum chamber walls. This is a very convenient method of batch processing of industrial parts by ion implantation, in which a large number of small to medium sized components can be treated by PIII and PIII and D, very quickly, efficiently, and also at low cost.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2016 Tipo de documento: Article País de afiliação: Brasil País de publicação: Estados Unidos
Texto completo
Adicionar na Minha BVS
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Rev Sci Instrum Ano de publicação: 2016 Tipo de documento: Article País de afiliação: Brasil País de publicação: Estados Unidos