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Electronic confinement in graphene ruled by N doped extended defects.
Brito, W H; Chacham, H; Kagimura, R; Miwa, R H.
Afiliação
  • Brito WH; Departamento de Física, Universidade Federal de Minas Gerais, CP 702, 31270-901, Belo Horizonte, MG, Brazil.
Nanotechnology ; 25(24): 245706, 2014 Jun 20.
Article em En | MEDLINE | ID: mdl-24870126
We investigate by means of ab-initio simulations the formation energy and the electronic properties of substitutional N doping in graphene with distinct grain boundary defects as a function of the N concentration. Our results show that the presence of substitutional N atoms along the defective regions is quite likely for several N concentrations. Also, we find either semiconducting or metallic structures, depending on the N concentration. Confinement effects were also investigated for the semiconducting structures. We find that the distance between the defect lines can modulate the band structure of those semiconducting N doped lines. This opens an interesting possibility to produce two-dimensional heterojunctions composed by N doped grain boundaries with different distances between the defect lines.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2014 Tipo de documento: Article País de afiliação: Brasil País de publicação: Reino Unido

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2014 Tipo de documento: Article País de afiliação: Brasil País de publicação: Reino Unido