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Atomically Precise Graphene Nanoribbon Transistors with Long-Term Stability and Reliability.
Dinh, Christina; Yusufoglu, Muhammed; Yumigeta, Kentaro; Kinikar, Amogh; Sweepe, Thomas; Zeszut, Zoe; Chang, Yao-Jen; Copic, Christian; Janssen, Shelby; Holloway, Richard; Battaglia, Julian; Kuntubek, Aldiyar; Zahin, Farhan; Lin, Yuxuan Cosmi; Vandenberghe, William G; LeRoy, Brian J; Müllen, Klaus; Fasel, Roman; Borin Barin, Gabriela; Mutlu, Zafer.
Afiliación
  • Dinh C; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Yusufoglu M; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Yumigeta K; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Kinikar A; Empa, Swiss Federal Laboratories for Materials Science & Technology, Dübendorf 8600, Switzerland.
  • Sweepe T; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Zeszut Z; Kuiper-Arizona Laboratory for Astromaterials Analysis, University of Arizona, Tucson, Arizona 85721, United States.
  • Chang YJ; Kuiper-Arizona Laboratory for Astromaterials Analysis, University of Arizona, Tucson, Arizona 85721, United States.
  • Copic C; Department of Electrical & Computer Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Janssen S; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Holloway R; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Battaglia J; Department of Materials Science & Engineering, University of Arizona, Tucson, Arizona 85721, United States.
  • Kuntubek A; Department of Physics, University of Arizona, Tucson, Arizona 85721, United States.
  • Zahin F; Department of Materials Science & Engineering, Texas A&M University, College Station, Texas 77840, United States.
  • Lin YC; Department of Materials Science & Engineering, Texas A&M University, College Station, Texas 77840, United States.
  • Vandenberghe WG; Department of Materials Science & Engineering, University of Texas at Dallas, Richardson, Texas 75080, United States.
  • LeRoy BJ; Department of Physics, University of Arizona, Tucson, Arizona 85721, United States.
  • Müllen K; Max Planck Institute for Polymer Research, Mainz 55128, Germany.
  • Fasel R; Empa, Swiss Federal Laboratories for Materials Science & Technology, Dübendorf 8600, Switzerland.
  • Borin Barin G; Department of Chemistry, Biochemistry & Pharmaceutical Sciences, University of Bern, Bern 3012, Switzerland.
  • Mutlu Z; Empa, Swiss Federal Laboratories for Materials Science & Technology, Dübendorf 8600, Switzerland.
ACS Nano ; 18(34): 22949-22957, 2024 Aug 27.
Article en En | MEDLINE | ID: mdl-39145671
ABSTRACT
Atomically precise graphene nanoribbons (GNRs) synthesized from the bottom-up exhibit promising electronic properties for high-performance field-effect transistors (FETs). The feasibility of fabricating FETs with GNRs (GNRFETs) has been demonstrated, with ongoing efforts aimed at further improving their performance. However, their long-term stability and reliability remain unexplored, which is as important as their performance for practical applications. In this work, we fabricated short-channel FETs with nine-atom-wide armchair GNRs (9-AGNRFETs). We revealed that the on-state (ION) current performance of the 9-AGNRFETs deteriorates significantly over consecutive full transistor on and off logic cycles, which has neither been demonstrated nor previously considered. To address this issue, we deposited a thin ∼10 nm thick atomic layer deposition (ALD) layer of aluminum oxide (Al2O3) directly on these devices. The integrity, compatibility, electrical performance, stability, and reliability, of the GNRFETs before and/or after Al2O3 deposition were comprehensively studied. The results indicate that the observed decline in electrical device performance is most likely due to the degradation of contact resistance over multiple measurement cycles. We successfully demonstrated that the devices with the Al2O3 layer operate well up to several thousand continuous full cycles without any degradation. Our study offers valuable insights into the stability and reliability of GNR transistors, which could facilitate their large-scale integration into practical applications.
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Nano Año: 2024 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Nano Año: 2024 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos