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Single-cavity loss-enabled nanometrology.
Xu, Jipeng; Mao, Yuanhao; Li, Zhipeng; Zuo, Yunlan; Zhang, Jianfa; Yang, Biao; Xu, Wei; Liu, Ning; Deng, Zhi Jiao; Chen, Wei; Xia, Keyu; Qiu, Cheng-Wei; Zhu, Zhihong; Jing, Hui; Liu, Ken.
Afiliación
  • Xu J; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Mao Y; Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, China.
  • Li Z; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Zuo Y; Department of Electrical and Computer Engineering, National University of Singapore, Singapore, Singapore.
  • Zhang J; Key Laboratory of Low-Dimensional Quantum Structures and Quantum Control of Ministry of Education, Department of Physics, Hunan Normal University, Changsha, China.
  • Yang B; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Xu W; Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, China.
  • Liu N; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Deng ZJ; Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, China.
  • Chen W; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Xia K; Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, China.
  • Qiu CW; College of Advanced Interdisciplinary Studies, National University of Defense Technology, Changsha, China.
  • Zhu Z; Hunan Provincial Key Laboratory of Novel Nano-Optoelectronic Information Materials and Devices, National University of Defense Technology, Changsha, China.
  • Jing H; Institute for Quantum Science and Technology, College of Science, National University of Defense Technology, Changsha, China.
  • Liu K; College of Meteorology and Oceanography, National University of Defense Technology, Changsha, China.
Nat Nanotechnol ; 2024 Jul 17.
Article en En | MEDLINE | ID: mdl-39020101
ABSTRACT
Optical monitoring of the position and alignment of objects with a precision of only a few nanometres is key in applications such as smart manufacturing and force sensing. Traditional optical nanometrology requires precise nanostructure fabrication, multibeam interference or complex postprocessing algorithms, sometimes hampering wider adoption of this technology. Here we show a simplified, yet robust, approach to achieve nanometric metrology down to 2 nm resolution that eliminates the need for any reference signal for interferometric measurements. We insert an erbium-doped quartz crystal absorber into a single Fabry-Pérot cavity with a length of 3 cm and then induce exceptional points by matching the optical loss with the intercavity coupling. We experimentally achieve a displacement response enhancement of 86 times compared with lossless methods, and theoretically argue that an enhancement of over 450 times, corresponding to subnanometre resolution, may be achievable. We also show a fivefold enhancement in the signal-to-noise ratio, thus demonstrating that non-Hermitian sensors can lead to improved performances over the Hermitian counterpart.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nat Nanotechnol Año: 2024 Tipo del documento: Article País de afiliación: China Pais de publicación: Reino Unido

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nat Nanotechnol Año: 2024 Tipo del documento: Article País de afiliación: China Pais de publicación: Reino Unido