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Cationic and anionic defect decoration of CoO through Cu dopants and oxygen vacancy for a High­Performance supercapacitor.
Feng, Yamin; Sun, Lingling; Qi, Zhiwen; Zhang, Yan; Wang, Gaoliang; Gao, Wenning; Liu, Weifeng.
Afiliación
  • Feng Y; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Sun L; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Qi Z; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Zhang Y; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Wang G; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Gao W; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China.
  • Liu W; College of physics and telecommunication engineering, Zhoukou Normal University, 466001, Zhoukou, PR China. Electronic address: lwfxynu@163.com.
J Colloid Interface Sci ; 652(Pt B): 1099-1107, 2023 Dec 15.
Article en En | MEDLINE | ID: mdl-37657210
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Colloid Interface Sci Año: 2023 Tipo del documento: Article Pais de publicación: Estados Unidos
Texto completo
Añadir a Mi BVS
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XML
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Colloid Interface Sci Año: 2023 Tipo del documento: Article Pais de publicación: Estados Unidos