Progress in Secondary Electron Yield Mapping in Charged Particle Microscopy.

Agarwal, Akshay; Kasaei, Leila; Schultz, Albert; Feldman, Leonard C; Goyal, Vivek

Agarwal, Akshay; Kasaei, Leila; Schultz, Albert; Feldman, Leonard C; Goyal, Vivek.

Afiliación

Agarwal A; Department of Electrical and Computer Engineering, Boston University, Boston, MA, USA.
Kasaei L; Department of Physics, Rutgers University, New Brunswick, NJ, USA.
Schultz A; Ionwerks Inc., Houston, TX, USA.
Feldman LC; Department of Physics, Rutgers University, New Brunswick, NJ, USA.
Goyal V; Department of Electrical and Computer Engineering, Boston University, Boston, MA, USA.

Microsc Microanal ; 29(Supplement_1): 741-742, 2023 Jul 22.

Article en En | MEDLINE | ID: mdl-37613428

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Microsc Microanal Año: 2023 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Reino Unido

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