Formation of submicron-sized silica patterns on flexible polymer substrates based on vacuum ultraviolet photo-oxidation.

Wu, Cheng-Tse; Soliman, Ahmed I A; Utsunomiya, Toru; Ichii, Takashi; Sugimura, Hiroyuki

Wu, Cheng-Tse; Soliman, Ahmed I A; Utsunomiya, Toru; Ichii, Takashi; Sugimura, Hiroyuki.

Afiliación

Wu CT; Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.
Soliman AIA; Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.
Utsunomiya T; Chemistry Department, Faculty of Science, Assiut University Assiut 71516 Egypt.
Ichii T; Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.
Sugimura H; Department of Materials Science and Engineering, Graduate School of Engineering, Kyoto University Kyoto 606-8501 Japan sugimura.hiroyuki.7m@kyoto-u.ac.jp +81-75-753-9131.

RSC Adv ; 9(55): 32313-32322, 2019 Oct 07.

Article en En | MEDLINE | ID: mdl-35530761

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: RSC Adv Año: 2019 Tipo del documento: Article Pais de publicación: Reino Unido

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