Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d31 and d33 of AlN and AlScN Thin Films.

Zhang, Hao; Wang, Yang; Wang, Lihao; Liu, Yichen; Chen, Hao; Wu, Zhenyu

Process Control Monitor (PCM) for Simultaneous Determination of the Piezoelectric Coefficients d₃₁ and d₃₃ of AlN and AlScN Thin Films.

Zhang, Hao; Wang, Yang; Wang, Lihao; Liu, Yichen; Chen, Hao; Wu, Zhenyu.

Afiliación

Zhang H; State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
Wang Y; School of Graduate Study, University of Chinese Academy of Sciences, Beijing 100049, China.
Wang L; State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
Liu Y; State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
Chen H; State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.
Wu Z; State Key Laboratory of Transducer Technology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China.

Micromachines (Basel) ; 13(4)2022 Apr 07.

Article en En | MEDLINE | ID: mdl-35457885

Palabras clave

ScxAl1−xN; laser interferometry; piezoelectric constants; piezoelectric film; synchrotron X-ray diffraction

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Micromachines (Basel) Año: 2022 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza

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