Vanadium and Manganese Carbonyls as Precursors in Electron-Induced and Thermal Deposition Processes.

Jungwirth, Felix; Knez, Daniel; Porrati, Fabrizio; Schuck, Alfons G; Huth, Michael; Plank, Harald; Barth, Sven

Jungwirth, Felix; Knez, Daniel; Porrati, Fabrizio; Schuck, Alfons G; Huth, Michael; Plank, Harald; Barth, Sven.

Afiliación

Jungwirth F; Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany.
Knez D; Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria.
Porrati F; Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany.
Schuck AG; Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany.
Huth M; Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany.
Plank H; Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria.
Barth S; Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria.

Nanomaterials (Basel) ; 12(7)2022 Mar 28.

Article en En | MEDLINE | ID: mdl-35407228

Palabras clave

CVD; FEBID; electrical transport characteristics; manganese; metal carbonyl; vanadium

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Año: 2022 Tipo del documento: Article País de afiliación: Alemania Pais de publicación: Suiza

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