The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content.

Kluska, Stanislawa; Jurzecka-Szymacha, Maria; Nosidlak, Natalia; Dulian, Piotr; Jaglarz, Janusz

Kluska, Stanislawa; Jurzecka-Szymacha, Maria; Nosidlak, Natalia; Dulian, Piotr; Jaglarz, Janusz.

Afiliación

Kluska S; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Mickiewicza Avenue 30, 30-059 Krakow, Poland.
Jurzecka-Szymacha M; Faculty of Materials Science and Ceramics, AGH University of Science and Technology, Mickiewicza Avenue 30, 30-059 Krakow, Poland.
Nosidlak N; Department of Physics, Cracow University of Technology, Podchorazych Street 1, 30-084 Krakow, Poland.
Dulian P; Faculty of Chemical Engineering and Technology, Cracow University of Technology, Warszawska Street 24, 31-155 Krakow, Poland.
Jaglarz J; Institute of Materials Engineering, Cracow University of Technology, Jana Pawla II Avenue 37, 31-864 Krakow, Poland.

Materials (Basel) ; 15(6)2022 Mar 18.

Article en En | MEDLINE | ID: mdl-35329711

Palabras clave

PECVD technique; amorphous SiNx:H layers; spectroscopic ellipsometry; thermo-optical properties

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Materials (Basel) Año: 2022 Tipo del documento: Article País de afiliación: Polonia Pais de publicación: Suiza

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