A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope.

Deng, Xiao; Dai, Gaoliang; Liu, Jie; Hu, Xiukun; Bergmann, Detlef; Zhao, Jun; Tai, Renzhong; Cai, Xiaoyu; Li, Yuan; Li, Tongbao; Cheng, Xinbin

Deng, Xiao; Dai, Gaoliang; Liu, Jie; Hu, Xiukun; Bergmann, Detlef; Zhao, Jun; Tai, Renzhong; Cai, Xiaoyu; Li, Yuan; Li, Tongbao; Cheng, Xinbin.

Afiliación

Deng X; School of Physics Science and Engineering, Tongji University, Shanghai, China.
Dai G; Physikalisch-Technische Bundesanstalt, Braunschweig 38116, Germany. Electronic address: gaoliang.dai@ptb.de.
Liu J; School of Physics Science and Engineering, Tongji University, Shanghai, China.
Hu X; Physikalisch-Technische Bundesanstalt, Braunschweig 38116, Germany.
Bergmann D; Physikalisch-Technische Bundesanstalt, Braunschweig 38116, Germany.
Zhao J; Shanghai Advanced Research Institute, Chinese Academy of Sciences.
Tai R; Shanghai Advanced Research Institute, Chinese Academy of Sciences.
Cai X; Shanghai Institute of Measurement and Testing Technology, Shanghai, China.
Li Y; Shanghai Institute of Measurement and Testing Technology, Shanghai, China.
Li T; School of Physics Science and Engineering, Tongji University, Shanghai, China.
Cheng X; School of Physics Science and Engineering, Tongji University, Shanghai, China. Electronic address: chengxb@tongji.edu.cn.

Ultramicroscopy ; 226: 113293, 2021 Jul.

Article en En | MEDLINE | ID: mdl-33993000

Palabras clave

Calibration; Field distortion; Lateral standards; Magnification; Metrological atomic force microscopy; Scanning electron microscopy

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Ultramicroscopy Año: 2021 Tipo del documento: Article País de afiliación: China Pais de publicación: Países Bajos

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