Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering.

Baik, Sung-Il; Kim, Young-Woon

Baik, Sung-Il; Kim, Young-Woon.

Afiliación

Baik SI; Research Institute of Advanced Materials, Department of Materials Science and Engineering, Seoul National University, 1 Gwanak-ro Gwanak-gu, Seoul, Republic of Korea.
Kim YW; Present address: Department of Materials Science & Engineering, Northwestern University, Evanston, IL, 60208, USA.

Appl Microsc ; 50(1): 7, 2020 Feb 27.

Article en En | MEDLINE | ID: mdl-33580437

Palabras clave

Inductively coupled plasma (ICP); Microstructure; Tantalum nitride (TaN); Thin film; Transition metals; Transmission electron microscopy (TEM)

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Appl Microsc Año: 2020 Tipo del documento: Article Pais de publicación: