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High-Quality Few-Layer Graphene on Single-Crystalline SiC thin Film Grown on Affordable Wafer for Device Applications.
Endoh, Norifumi; Akiyama, Shoji; Tashima, Keiichiro; Suwa, Kento; Kamogawa, Takamasa; Kohama, Roki; Funakubo, Kazutoshi; Konishi, Shigeru; Mogi, Hiroshi; Kawahara, Minoru; Kawai, Makoto; Kubota, Yoshihiro; Ohkochi, Takuo; Kotsugi, Masato; Horiba, Koji; Kumigashira, Hiroshi; Suemitsu, Maki; Watanabe, Issei; Fukidome, Hirokazu.
Afiliación
  • Endoh N; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Akiyama S; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Tashima K; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Suwa K; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Kamogawa T; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Kohama R; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Funakubo K; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Konishi S; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Mogi H; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Kawahara M; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Kawai M; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Kubota Y; Shin-Etsu Chemical Co., Ltd., Chiyoda-ku, Tokyo 100-0004, Japan.
  • Ohkochi T; Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan.
  • Kotsugi M; Japan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, Japan.
  • Horiba K; Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, Tsukuba, Ibaraki 305-0801, Japan.
  • Kumigashira H; Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, Tsukuba, Ibaraki 305-0801, Japan.
  • Suemitsu M; Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Watanabe I; Research Institute of Electrical Communication, Tohoku University, Sendai, Miyagi 980-8577, Japan.
  • Fukidome H; National Institute of Information and Communication Technology, Koganei, Tokyo 184-8795, Japan.
Nanomaterials (Basel) ; 11(2)2021 Feb 04.
Article en En | MEDLINE | ID: mdl-33557014
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Año: 2021 Tipo del documento: Article País de afiliación: Japón Pais de publicación: Suiza
Texto completo
Añadir a Mi BVS
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Año: 2021 Tipo del documento: Article País de afiliación: Japón Pais de publicación: Suiza