Photoelectrochemistry of Self-Limiting Electrodeposition of Ni Film onto GaAs.

Xu, Yin; Ahmed, Rasin; Zheng, Jiyuan; Hoglund, Eric R; Lin, Qiyuan; Berretti, Enrico; Lavacchi, Alessandro; Zangari, Giovanni

Xu, Yin; Ahmed, Rasin; Zheng, Jiyuan; Hoglund, Eric R; Lin, Qiyuan; Berretti, Enrico; Lavacchi, Alessandro; Zangari, Giovanni.

Afiliación

Xu Y; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Ahmed R; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Zheng J; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Hoglund ER; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Lin Q; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.
Berretti E; CNR-ICCOM, Via Madonna del Piano 10, Sesto Fiorentino, Florence, 50019, Italy.
Lavacchi A; CNR-ICCOM, Via Madonna del Piano 10, Sesto Fiorentino, Florence, 50019, Italy.
Zangari G; Department of Materials Science and Engineering, University of Virginia, Charlottesville, VA, 22904, USA.

Small ; 16(39): e2003112, 2020 Oct.

Article en En | MEDLINE | ID: mdl-32885599

Palabras clave

Ni hydroxide; electrodeposition; metal-insulator-semiconductors; n-GaAs; photoelectrochemical catalysis

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Small Asunto de la revista: ENGENHARIA BIOMEDICA Año: 2020 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Alemania

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