Surface Characterization of MoS<sub>2</sub> Atomic Layers Mechanically Exfoliated on a Si Substrate.

Krawczyk, Miroslaw; Pisarek, Marcin; Szoszkiewicz, Robert; Jablonski, Aleksander

Surface Characterization of MoS₂ Atomic Layers Mechanically Exfoliated on a Si Substrate.

Krawczyk, Miroslaw; Pisarek, Marcin; Szoszkiewicz, Robert; Jablonski, Aleksander.

Afiliación

Krawczyk M; Laboratory of Surface Analysis, Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 44/52, 01-224 Warsaw, Poland.
Pisarek M; Laboratory of Surface Analysis, Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 44/52, 01-224 Warsaw, Poland.
Szoszkiewicz R; Biological and Chemical Research Centre, Faculty of Chemistry, University of Warsaw, Zwirki Wigury 101, 02-089 Warsaw, Poland.
Jablonski A; Laboratory of Surface Analysis, Institute of Physical Chemistry, Polish Academy of Sciences, Kasprzaka 44/52, 01-224 Warsaw, Poland.

Materials (Basel) ; 13(16)2020 Aug 14.

Article en En | MEDLINE | ID: mdl-32823911

Palabras clave

Auger electron spectroscopy; elastic-peak electron spectroscopy; electron inelastic mean free path; molybdenum disulfide; scanning electron microscopy; surface composition and morphology

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Materials (Basel) Año: 2020 Tipo del documento: Article País de afiliación: Polonia Pais de publicación: Suiza

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