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Competing Magnetic Interactions in the Antiferromagnetic Topological Insulator MnBi_{2}Te_{4}.
Li, Bing; Yan, J-Q; Pajerowski, D M; Gordon, Elijah; Nedic, A-M; Sizyuk, Y; Ke, Liqin; Orth, P P; Vaknin, D; McQueeney, R J.
Afiliación
  • Li B; Ames Laboratory, Ames, Iowa 50011, USA.
  • Yan JQ; Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA.
  • Pajerowski DM; Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA.
  • Gordon E; Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA.
  • Nedic AM; Ames Laboratory, Ames, Iowa 50011, USA.
  • Sizyuk Y; Ames Laboratory, Ames, Iowa 50011, USA.
  • Ke L; Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA.
  • Orth PP; Ames Laboratory, Ames, Iowa 50011, USA.
  • Vaknin D; Ames Laboratory, Ames, Iowa 50011, USA.
  • McQueeney RJ; Ames Laboratory, Ames, Iowa 50011, USA.
Phys Rev Lett ; 124(16): 167204, 2020 Apr 24.
Article en En | MEDLINE | ID: mdl-32383954
The antiferromagnetic (AFM) compound MnBi_{2}Te_{4} is suggested to be the first realization of an AFM topological insulator. We report on inelastic neutron scattering studies of the magnetic interactions in MnBi_{2}Te_{4} that possess ferromagnetic triangular layers with AFM interlayer coupling. The spin waves display a large spin gap and pairwise exchange interactions within the triangular layer are long ranged and frustrated by large next-nearest neighbor AFM exchange. The degree of frustration suggests proximity to a variety of magnetic phases, potentially including skyrmion phases, which could be accessed in chemically tuned compounds or upon the application of symmetry-breaking fields.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2020 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2020 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos