Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene.

Müller, Martin; Bousa, Milan; Hájková, Zdenka; Ledinský, Martin; Fejfar, Antonín; Drogowska-Horná, Karolina; Kalbác, Martin; Frank, And Otakar

Müller, Martin; Bousa, Milan; Hájková, Zdenka; Ledinský, Martin; Fejfar, Antonín; Drogowska-Horná, Karolina; Kalbác, Martin; Frank, And Otakar.

Afiliación

Müller M; Institute of Physics, Czech Academy of Sciences, Cukrovarnická 10, 162 00 Prague, Czech Republic.
Bousa M; J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejskova 2155/3, 182 23 Prague, Czech Republic.
Hájková Z; Institute of Physics, Czech Academy of Sciences, Cukrovarnická 10, 162 00 Prague, Czech Republic.
Ledinský M; Institute of Physics, Czech Academy of Sciences, Cukrovarnická 10, 162 00 Prague, Czech Republic.
Fejfar A; Institute of Physics, Czech Academy of Sciences, Cukrovarnická 10, 162 00 Prague, Czech Republic.
Drogowska-Horná K; J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejskova 2155/3, 182 23 Prague, Czech Republic.
Kalbác M; J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejskova 2155/3, 182 23 Prague, Czech Republic.
Frank AO; J. Heyrovský Institute of Physical Chemistry, Czech Academy of Sciences, Dolejskova 2155/3, 182 23 Prague, Czech Republic.

Nanomaterials (Basel) ; 10(3)2020 Mar 24.

Article en En | MEDLINE | ID: mdl-32213885

Palabras clave

CVD; graphene; heterostructure; silicon

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Año: 2020 Tipo del documento: Article País de afiliación: República Checa Pais de publicación: Suiza

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