Low damage lamella preparation of metallic materials by FIB processing with low acceleration voltage and a low incident angle Ar ion milling finish.

Sato, T; Aizawa, Y; Matsumoto, H; Kiyohara, M; Kamiya, C; VON Cube, F

Sato, T; Aizawa, Y; Matsumoto, H; Kiyohara, M; Kamiya, C; VON Cube, F.

Afiliación

Sato T; Hitachi High-Technologies Corporation, Ichige, Hitachinaka-shi, Ibaraki, Japan.
Aizawa Y; Hitachi High-Technologies Corporation, Ichige, Hitachinaka-shi, Ibaraki, Japan.
Matsumoto H; Hitachi High-Technologies Corporation, Ichige, Hitachinaka-shi, Ibaraki, Japan.
Kiyohara M; Hitachi High-Tech Science Corporation, Takenoshita, Oyama-cho, Shizuoka, Japan.
Kamiya C; Hitachi High-Technologies Corporation, Ichige, Hitachinaka-shi, Ibaraki, Japan.
VON Cube F; Hitachi High-Technologies Europe GmbH, Europark, Fichtenhain, Krefeld, Germany.

J Microsc ; 279(3): 234-241, 2020 Sep.

Article en En | MEDLINE | ID: mdl-32043578

Palabras clave

Argon ion milling; FIB damage; low acceleration voltage and low incident angle; metallic materials

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Microsc Año: 2020 Tipo del documento: Article País de afiliación: Japón Pais de publicación: Reino Unido

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