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Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering.
Liang, Yanxia; Wang, Peipei; Wang, Yufei; Dai, Yijia; Hu, Zhaoyi; Tranca, Denis E; Hristu, Radu; Stanciu, Stefan G; Toma, Antonela; Stanciu, George A; Wang, Xingjun; Fu, Engang.
Afiliación
  • Liang Y; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. yxliang@pku.edu.cn.
  • Wang P; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. ppwang@pku.edu.cn.
  • Wang Y; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. yfwang1@pku.edu.cn.
  • Dai Y; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. daiyijia02@gmail.com.
  • Hu Z; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. zyhu1@pku.edu.cn.
  • Tranca DE; Center for Microscopy-Microanalysis and Information Processing, University Politehnica of Bucharest, 060042 Bucharest, Romania. denis_emanuil.tranca@upb.ro.
  • Hristu R; Center for Microscopy-Microanalysis and Information Processing, University Politehnica of Bucharest, 060042 Bucharest, Romania. hristu_radu@yahoo.com.
  • Stanciu SG; Center for Microscopy-Microanalysis and Information Processing, University Politehnica of Bucharest, 060042 Bucharest, Romania. sgstanciu@yahoo.com.
  • Toma A; Center for Microscopy-Microanalysis and Information Processing, University Politehnica of Bucharest, 060042 Bucharest, Romania. antonela2222@yahoo.com.
  • Stanciu GA; Center for Microscopy-Microanalysis and Information Processing, University Politehnica of Bucharest, 060042 Bucharest, Romania. stanciu@physics.pub.ro.
  • Wang X; State Key Laboratory of Advanced Optical Communication Systems and Networks, Peking University, Beijing 100871, China. xjwang@pku.edu.cn.
  • Fu E; State Key Laboratory of Nuclear Physics and Technology, School of Physics, Peking University, Beijing 100871, China. efu@pku.edu.cn.
Materials (Basel) ; 12(18)2019 Sep 17.
Article en En | MEDLINE | ID: mdl-31533217
Despite intense research on high entropy films, the mechanism of film growth and the influence of key factors remain incompletely understood. In this study, high entropy films consisting of five elements (FeCoNiCrAl) with columnar and nanometer-scale grains were prepared by magnetron sputtering. The high entropy film growth mechanism, including the formation of the amorphous domain, equiaxial nanocrystalline structure and columnar crystal was clarified by analyzing the microstructure in detail. Besides, the impacts of the important deposition parameters including the substrate temperature, the powder loaded in the target, and the crystal orientation of the substrate on the grain size and morphology, phase structure, crystallinity and elemental uniformity were revealed. The mechanical properties of high entropy films with various microstructure features were investigated by nanoindentation. With the optimized grain size and microstructure, the film deposited at 350 °C using a power of 100 W exhibits the highest hardness of 11.09 GPa. Our findings not only help understanding the mechanisms during the high entropy film deposition, but also provide guidance in manufacturing other novel high entropy films.
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Materials (Basel) Año: 2019 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza
Texto completo
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Materials (Basel) Año: 2019 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza