Fast Semiconductor-Metal Bidirectional Transition by Flame Chemical Vapor Deposition.

Choi, Myung Sik; Na, Han Gil; Bang, Jae Hoon; Oum, Wansik; Choi, Sun-Woo; Kim, Sang Sub; Kim, Hyoun Woo; Jin, Changhyun

Choi, Myung Sik; Na, Han Gil; Bang, Jae Hoon; Oum, Wansik; Choi, Sun-Woo; Kim, Sang Sub; Kim, Hyoun Woo; Jin, Changhyun.

Afiliación

Choi MS; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.
Na HG; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.
Bang JH; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.
Oum W; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.
Choi SW; Department of Materials and Metallurgical Engineering, Kangwon National University, Samcheok 25913, Republic of Korea.
Kim SS; Department of Materials Science and Engineering, Inha University, Incheon 22212, Republic of Korea.
Kim HW; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.
Jin C; Division of Materials Science and Engineering and The Research Institute of Industrial Science, Hanyang University, Seoul 04763, Republic of Korea.

ACS Omega ; 4(7): 11824-11831, 2019 Jul 31.

Article en En | MEDLINE | ID: mdl-31460291

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Omega Año: 2019 Tipo del documento: Article Pais de publicación: Estados Unidos

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