Recent progress in near-field nanolithography using light interactions with colloidal particles: from nanospheres to three-dimensional nanostructures.
Nanotechnology
; 30(35): 352002, 2019 Aug 30.
Article
en En
| MEDLINE
| ID: mdl-31100738
The advance of nanotechnology is firmly rooted in the development of cost-effective, versatile, and easily accessible nanofabrication techniques. The ability to pattern complex two-dimensional and three-dimensional nanostructured materials are particularly desirable, since they can have novel physical properties that are not found in bulk materials. This review article will report recent progress in utilizing self-assembly of colloidal particles for nanolithography. In these techniques, the near-field interactions of light and colloids are the sole mechanisms employed to generate the intensity distributions for patterning. Based on both 'bottom-up' self-assembly and 'top-down' lithography approaches, these processes are highly versatile and can take advantage of a number of optical effects, allowing the complex 3D nanostructures to be patterned using single exposures. There are several key advantages including low equipment cost, facile structure design, and patterning scalability, which will be discussed in detail. We will outline the underlying optical effects, review the geometries that can be fabricated, discuss key limitations, and highlight potential applications in nanophotonics, optoelectronic devices, and nanoarchitectured materials.
Texto completo:
1
Colección:
01-internacional
Base de datos:
MEDLINE
Idioma:
En
Revista:
Nanotechnology
Año:
2019
Tipo del documento:
Article
País de afiliación:
Estados Unidos
Pais de publicación:
Reino Unido