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Colossal Permittivity and Low Dielectric Loss of Thermal Oxidation Single-Crystalline Si Wafers.
Sun, Yalong; Wu, Di; Liu, Kai; Zheng, Fengang.
Afiliación
  • Sun Y; College of Physical Science and Technology, School of Optoelectronic Science and Engineering and Technology and Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China. 20164208051@stu.suda.edu.cn.
  • Wu D; College of Physical Science and Technology, School of Optoelectronic Science and Engineering and Technology and Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China. wudi@suda.edu.cn.
  • Liu K; College of Physical Science and Technology, School of Optoelectronic Science and Engineering and Technology and Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China. 20154208020@stu.suda.edu.cn.
  • Zheng F; College of Physical Science and Technology, School of Optoelectronic Science and Engineering and Technology and Jiangsu Key Laboratory of Thin Films, Soochow University, Suzhou 215006, China. zhfg@suda.edu.cn.
Materials (Basel) ; 12(7)2019 Apr 03.
Article en En | MEDLINE | ID: mdl-30987082
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Materials (Basel) Año: 2019 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza
Texto completo
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Materials (Basel) Año: 2019 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza