Boosting Modulation of Oxide Semiconductors via Voltage-Based Ambi-Ionic Migration.

Lee, Heesoo; Jung, Tae Soo; Park, Jeong Woo; Kim, Hyun Jae

Lee, Heesoo; Jung, Tae Soo; Park, Jeong Woo; Kim, Hyun Jae.

Afiliación

Lee H; School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-ro , Seodaemun-gu, Seoul 03722 , Republic of Korea.
Jung TS; School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-ro , Seodaemun-gu, Seoul 03722 , Republic of Korea.
Park JW; School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-ro , Seodaemun-gu, Seoul 03722 , Republic of Korea.
Kim HJ; School of Electrical and Electronic Engineering , Yonsei University , 50 Yonsei-ro , Seodaemun-gu, Seoul 03722 , Republic of Korea.

ACS Appl Mater Interfaces ; 10(43): 37216-37222, 2018 Oct 31.

Article en En | MEDLINE | ID: mdl-30298732

Palabras clave

amorphous oxide thin-film transistors; ion migration; potassium superoxide; thin film modulation; voltage-driven

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2018 Tipo del documento: Article Pais de publicación: Estados Unidos

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