Robustness of Voltage-induced Magnetocapacitance.

Kaiju, Hideo; Misawa, Takahiro; Nagahama, Taro; Komine, Takashi; Kitakami, Osamu; Fujioka, Masaya; Nishii, Junji; Xiao, Gang

Kaiju, Hideo; Misawa, Takahiro; Nagahama, Taro; Komine, Takashi; Kitakami, Osamu; Fujioka, Masaya; Nishii, Junji; Xiao, Gang.

Afiliación

Kaiju H; Research Institute for Electronic Science, Hokkaido University, Sapporo, Hokkaido, 001-0020, Japan. kaiju@es.hokudai.ac.jp.
Misawa T; Research Institute for Electronic Science, Hokkaido University, Sapporo, Hokkaido, 001-0020, Japan.
Nagahama T; Graduate School of Engineering, Hokkaido University, Sapporo, Hokkaido, 060-8628, Japan.
Komine T; Graduate School of Science and Engineering, Ibaraki University, Hitachi, Ibaraki, 316-8511, Japan.
Kitakami O; Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, Miyagi, 980-8577, Japan.
Fujioka M; Research Institute for Electronic Science, Hokkaido University, Sapporo, Hokkaido, 001-0020, Japan.
Nishii J; Research Institute for Electronic Science, Hokkaido University, Sapporo, Hokkaido, 001-0020, Japan.
Xiao G; Department of Physics, Brown University, Providence, RI, 02912, USA.

Sci Rep ; 8(1): 14709, 2018 Oct 02.

Article en En | MEDLINE | ID: mdl-30279552

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Sci Rep Año: 2018 Tipo del documento: Article País de afiliación: Japón Pais de publicación: Reino Unido

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