Grafting Behavior for the Resonating Variants of Ethynylaniline on Hydrogenated Silicon (100) Surfaces under Thermal Hydrosilylation.

Tung, Joline; Tew, Lih Shin; Coluccini, Carmine; Lin, Yue-Der; Khung, Yit Lung

Tung, Joline; Tew, Lih Shin; Coluccini, Carmine; Lin, Yue-Der; Khung, Yit Lung.

Afiliación

Tung J; College of Arts and Sciences, University of North Carolina at Chapel Hill (UNC), Chapel Hill, NC, 27514, USA.
Tew LS; Advanced Medical and Dental Institute (AMDI), Universiti Sains Malaysia, 13200, Kepala Batas Pulau Pinang, Malaysia.
Coluccini C; Institute of New Drug Development, China Medical University, No.91 Hsueh-Shih Road, Taichung, Taiwan.
Lin YD; Department of Automatic Control Engineering, Feng Chia University, No. 100, Wenhwa Rd., Seatwen, Taichung, Taiwan.
Khung YL; Department of Biological Science and Technology, China Medical University, No.91 Hsueh-Shih Road, Taichung, Taiwan.

Chemistry ; 24(50): 13270-13277, 2018 Sep 06.

Article en En | MEDLINE | ID: mdl-29932257

Palabras clave

AFM; XPS; ethynylaniline; nucleophilic addition; thermal hydrosilylation

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Chemistry Asunto de la revista: QUIMICA Año: 2018 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Alemania

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