Antidamping-Torque-Induced Switching in Biaxial Antiferromagnetic Insulators.

Chen, X Z; Zarzuela, R; Zhang, J; Song, C; Zhou, X F; Shi, G Y; Li, F; Zhou, H A; Jiang, W J; Pan, F; Tserkovnyak, Y

Chen, X Z; Zarzuela, R; Zhang, J; Song, C; Zhou, X F; Shi, G Y; Li, F; Zhou, H A; Jiang, W J; Pan, F; Tserkovnyak, Y.

Afiliación

Chen XZ; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Zarzuela R; Department of Physics and Astronomy, University of California, Los Angeles, California 90095, USA.
Zhang J; School of Physics and Wuhan National High Magnetic Field Center, Huazhong University of Science and Technology, Wuhan 430074, China.
Song C; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Zhou XF; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Shi GY; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Li F; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Zhou HA; State Key Laboratory of Low-Dimensional Quantum Physics and Department of Physics, Tsinghua University, Beijing 100084, China.
Jiang WJ; State Key Laboratory of Low-Dimensional Quantum Physics and Department of Physics, Tsinghua University, Beijing 100084, China.
Pan F; Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Tserkovnyak Y; Department of Physics and Astronomy, University of California, Los Angeles, California 90095, USA.

Phys Rev Lett ; 120(20): 207204, 2018 May 18.

Article en En | MEDLINE | ID: mdl-29864355

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2018 Tipo del documento: Article País de afiliación: China Pais de publicación: Estados Unidos

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