Suppressing the Photocatalytic Activity of TiO2 Nanoparticles by Extremely Thin Al2O3 Films Grown by Gas-Phase Deposition at Ambient Conditions.

Guo, Jing; Van Bui, Hao; Valdesueiro, David; Yuan, Shaojun; Liang, Bin; van Ommen, J Ruud

Guo, Jing; Van Bui, Hao; Valdesueiro, David; Yuan, Shaojun; Liang, Bin; van Ommen, J Ruud.

Afiliación

Guo J; Product & Process Engineering, Department of Chemical Engineering, Faculty of Applied Sciences, Delft University of Technology, 2629 HZ Delft, The Netherlands. guojing0519@hotmail.com.
Van Bui H; Multi-Phase Mass Transfer & Reaction Engineering Lab, College of Chemical Engineering, Sichuan University, Chengdu 610065, China. guojing0519@hotmail.com.
Valdesueiro D; Shanxi Province Key Laboratory of Higee-Oriented Chemical Engineering, North University of China, Taiyuan 030051, China. guojing0519@hotmail.com.
Yuan S; Product & Process Engineering, Department of Chemical Engineering, Faculty of Applied Sciences, Delft University of Technology, 2629 HZ Delft, The Netherlands. V.H.Bui@tudelft.nl.
Liang B; Department of Physics, Quy Nhon University, 170 An Duong Vuong Street, Quy Nhon City 590000, Vietnam. V.H.Bui@tudelft.nl.
van Ommen JR; Product & Process Engineering, Department of Chemical Engineering, Faculty of Applied Sciences, Delft University of Technology, 2629 HZ Delft, The Netherlands. d.valdesueiro@delft-imp.nl.

Nanomaterials (Basel) ; 8(2)2018 Jan 24.

Article en En | MEDLINE | ID: mdl-29364840

Palabras clave

TiO2 pigments; atomic layer deposition; fluidized bed reactor; photocatalytic suppression; ultrathin Al2O3 films

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Año: 2018 Tipo del documento: Article País de afiliación: Países Bajos Pais de publicación: Suiza

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