Enabling Simultaneous Extreme Ultra Low-k in Stiff, Resilient, and Thermally Stable Nano-Architected Materials.

Lifson, Max L; Kim, Min-Woo; Greer, Julia R; Kim, Bong-Joong

Lifson, Max L; Kim, Min-Woo; Greer, Julia R; Kim, Bong-Joong.

Afiliación

Lifson ML; Division of Engineering and Applied Science, California Institute of Technology , Pasadena, California 91125, United States.
Kim MW; School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST) , Gwangju 61005, Korea.
Greer JR; Division of Engineering and Applied Science, California Institute of Technology , Pasadena, California 91125, United States.
Kim BJ; School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST) , Gwangju 61005, Korea.

Nano Lett ; 17(12): 7737-7743, 2017 12 13.

Article en En | MEDLINE | ID: mdl-29112423

Palabras clave

Dielectric constant; Young's modulus; low-k; nanolattice; porosity

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos

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