Atomic Layer Deposition of Rhenium-Aluminum Oxide Thin Films and ReO<sub>x</sub> Incorporation in a Metal-Organic Framework.

Rimoldi, Martino; Hupp, Joseph T; Farha, Omar K

Atomic Layer Deposition of Rhenium-Aluminum Oxide Thin Films and ReO_x Incorporation in a Metal-Organic Framework.

Rimoldi, Martino; Hupp, Joseph T; Farha, Omar K.

Afiliación

Rimoldi M; Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.
Hupp JT; Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.
Farha OK; Department of Chemistry, Northwestern University , 2145 Sheridan Road, Evanston, Illinois 60208, United States.

ACS Appl Mater Interfaces ; 9(40): 35067-35074, 2017 Oct 11.

Article en En | MEDLINE | ID: mdl-28929746

Palabras clave

atomic layer deposition; gas flow; hydrogenation; metal−organic framework; rhenium oxide; thin film; trimethylaluminum

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Estados Unidos

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