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Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films.
Emori, Satoru; Gray, Benjamin A; Jeon, Hyung-Min; Peoples, Joseph; Schmitt, Maxwell; Mahalingam, Krishnamurthy; Hill, Madelyn; McConney, Michael E; Gray, Matthew T; Alaan, Urusa S; Bornstein, Alexander C; Shafer, Padraic; N'Diaye, Alpha T; Arenholz, Elke; Haugstad, Greg; Meng, Keng-Yuan; Yang, Fengyuan; Li, Dongyao; Mahat, Sushant; Cahill, David G; Dhagat, Pallavi; Jander, Albrecht; Sun, Nian X; Suzuki, Yuri; Howe, Brandon M.
Afiliación
  • Emori S; Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA.
  • Gray BA; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • Jeon HM; Department of Electrical Engineering, Wright State University, Dayton, OH, 45431, USA.
  • Peoples J; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • Schmitt M; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • Mahalingam K; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • Hill M; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • McConney ME; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
  • Gray MT; Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA.
  • Alaan US; Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA.
  • Bornstein AC; Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA.
  • Shafer P; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • N'Diaye AT; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • Arenholz E; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA.
  • Haugstad G; College of Science and Engineering Characterization Facility, University of Minnesota, Minneapolis, MN, 55455, USA.
  • Meng KY; Department of Physics, The Ohio State University, Columbus, OH, 43210, USA.
  • Yang F; Department of Physics, The Ohio State University, Columbus, OH, 43210, USA.
  • Li D; Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA.
  • Mahat S; Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA.
  • Cahill DG; Department of Materials Science and Engineering, University of Illinois, Urbana, IL, 61801, USA.
  • Dhagat P; Department of Electrical Engineering and Computer Science, Oregon State University, Corvallis, OR, 97331, USA.
  • Jander A; Department of Electrical Engineering and Computer Science, Oregon State University, Corvallis, OR, 97331, USA.
  • Sun NX; Department of Electrical Engineering, Northeastern University, Boston, MA, 02115, USA.
  • Suzuki Y; Geballe Laboratory for Advanced Materials, Stanford University, Stanford, CA, 94305, USA.
  • Howe BM; Materials and Manufacturing Directorate, Air Force Research Laboratory, WPAFB, OH, 45433, USA.
Adv Mater ; 29(34)2017 Sep.
Article en En | MEDLINE | ID: mdl-28691378

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Adv Mater Asunto de la revista: BIOFISICA / QUIMICA Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Alemania

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Adv Mater Asunto de la revista: BIOFISICA / QUIMICA Año: 2017 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Alemania