A graphene barristor using nitrogen profile controlled ZnO Schottky contacts.
Nanoscale
; 9(7): 2442-2448, 2017 Feb 16.
Article
en En
| MEDLINE
| ID: mdl-28165105
We have successfully demonstrated a graphene-ZnO:N Schottky barristor. The barrier height between graphene and ZnO:N could be modulated by a buried gate electrode in the range of 0.5-0.73 eV, and an on-off ratio of up to 107 was achieved. By using a nitrogen-doped ZnO film as a Schottky contact material, the stability problem of previously reported graphene barristors could be greatly alleviated and a facile route to build a top-down processed graphene barristor was realized with a very low heat cycle. This device will be instrumental when implementing logic functions in systems requiring high-performance logic devices fabricated with a low temperature fabrication process such as back-end integrated logic devices or flexible devices on soft substrates.
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MEDLINE
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Revista:
Nanoscale
Año:
2017
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Article
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Reino Unido