Optical nano artifact metrics using silicon random nanostructures.

Matsumoto, Tsutomu; Yoshida, Naoki; Nishio, Shumpei; Hoga, Morihisa; Ohyagi, Yasuyuki; Tate, Naoya; Naruse, Makoto

Matsumoto, Tsutomu; Yoshida, Naoki; Nishio, Shumpei; Hoga, Morihisa; Ohyagi, Yasuyuki; Tate, Naoya; Naruse, Makoto.

Afiliación

Matsumoto T; Graduate School of Environment and Information Sciences, Yokohama National University, 79-7 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan.
Yoshida N; Institute of Advanced Sciences, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan.
Nishio S; Graduate School of Environment and Information Sciences, Yokohama National University, 79-7 Tokiwadai, Hodogaya, Yokohama, Kanagawa 240-8501, Japan.
Hoga M; Dai Nippon Printing Co., Ltd., 250-1 Wakashiba, Kashiwa, Chiba 277-0871, Japan.
Ohyagi Y; Dai Nippon Printing Co., Ltd., 250-1 Wakashiba, Kashiwa, Chiba 277-0871, Japan.
Tate N; Dai Nippon Printing Co., Ltd., 250-1 Wakashiba, Kashiwa, Chiba 277-0871, Japan.
Naruse M; Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.

Sci Rep ; 6: 32438, 2016 08 31.

Article en En | MEDLINE | ID: mdl-27578146

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Clinical_trials Idioma: En Revista: Sci Rep Año: 2016 Tipo del documento: Article País de afiliación: Japón Pais de publicación: Reino Unido

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