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Defect visualization of Cu(InGa)(SeS)2 thin films using DLTS measurement.
Heo, Sung; Chung, JaeGwan; Lee, Hyung-Ik; Lee, Junho; Park, Jong-Bong; Cho, Eunae; Kim, KiHong; Kim, Seong Heon; Park, Gyeong Su; Lee, Dongho; Lee, Jaehan; Nam, Junggyu; Yang, JungYup; Lee, Dongwha; Cho, Hoon Young; Kang, Hee Jae; Choi, Pyung-Ho; Choi, Byoung-Deog.
Afiliación
  • Heo S; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Chung J; College of Information and Communication Engineering, Sungkyunkwan University, Cheoncheon-dong 300, Jangan-gu, Suwon 440-746, Korea.
  • Lee HI; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Lee J; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Park JB; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Cho E; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Kim K; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Kim SH; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Park GS; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Lee D; Analytical Engineering Group, Samsung Advanced Institute of Technology, 130, Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, 443-803, Korea.
  • Lee J; PV Development Team, Energy Solution Business Division, Samsung SDI, 467, Beonyeong-ro, Cheonan-si, Chungcheongnam-do 331-330, Korea.
  • Nam J; PV Development Team, Energy Solution Business Division, Samsung SDI, 467, Beonyeong-ro, Cheonan-si, Chungcheongnam-do 331-330, Korea.
  • Yang J; PV Development Team, Energy Solution Business Division, Samsung SDI, 467, Beonyeong-ro, Cheonan-si, Chungcheongnam-do 331-330, Korea.
  • Lee D; Department of Physics, College of Science and Technology, Kunsan National University, Kunsan, 54150, Korea.
  • Cho HY; Department of Physics, Dongguk University, 100-715, Korea.
  • Kang HJ; Department of Physics, Dongguk University, 100-715, Korea.
  • Choi PH; Department of Physics, Chungbuk National University, Cheongju, 28644, Korea.
  • Choi BD; College of Information and Communication Engineering, Sungkyunkwan University, Cheoncheon-dong 300, Jangan-gu, Suwon 440-746, Korea.
Sci Rep ; 6: 30554, 2016 08 01.
Article en En | MEDLINE | ID: mdl-27476672
Defect depth profiles of Cu (In1-x,Gax)(Se1-ySy)2 (CIGSS) were measured as functions of pulse width and voltage via deep-level transient spectroscopy (DLTS). Four defects were observed, i.e., electron traps of ~0.2 eV at 140 K (E1 trap) and 0.47 eV at 300 K (E2 trap) and hole traps of ~0.1 eV at 100 K (H1 trap) and ~0.4 eV at 250 K (H2 trap). The open circuit voltage (VOC) deteriorated when the trap densities of E2 were increased. The energy band diagrams of CIGSS were also obtained using Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), and DLTS data. These results showed that the valence band was lowered at higher S content. In addition, it was found that the E2 defect influenced the VOC and could be interpreted as an extended defect. Defect depth profile images provided clear insight into the identification of defect state and density as a function of depth around the space charge region.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Sci Rep Año: 2016 Tipo del documento: Article Pais de publicación: Reino Unido

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Sci Rep Año: 2016 Tipo del documento: Article Pais de publicación: Reino Unido