Comparison of Electron Imaging Modes for Dimensional Measurements in the Scanning Electron Microscope.

Postek, Michael T; Vladár, András E; Villarrubia, John S; Muto, Atsushi

Postek, Michael T; Vladár, András E; Villarrubia, John S; Muto, Atsushi.

Afiliación

Postek MT; 1Engineering Physics Division,National Institute of Standards and Technology,100 Bureau Drive,MS 8120,Gaithersburg,MD 20899,USA.
Vladár AE; 1Engineering Physics Division,National Institute of Standards and Technology,100 Bureau Drive,MS 8120,Gaithersburg,MD 20899,USA.
Villarrubia JS; 1Engineering Physics Division,National Institute of Standards and Technology,100 Bureau Drive,MS 8120,Gaithersburg,MD 20899,USA.
Muto A; 2Hitachi High Technologies America, Inc.,22610 Gateway Center Drive,Suite 100,Clarksburg,MD 20871,USA.

Microsc Microanal ; 22(4): 768-77, 2016 08.

Article en En | MEDLINE | ID: mdl-27452278

Palabras clave

JMONSEL; backscattered electrons; electron beam modeling; low loss electrons; metrology; secondary electrons

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Microsc Microanal Año: 2016 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Reino Unido

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