Continuous and Collective Grain Rotation in Nanoscale Thin Films during Silicidation.

Richard, M-I; Fouet, J; Texier, M; Mocuta, C; Guichet, C; Thomas, O

Richard, M-I; Fouet, J; Texier, M; Mocuta, C; Guichet, C; Thomas, O.

Afiliación

Richard MI; Aix Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, 13397 Marseille, France.
Fouet J; ID01/ESRF, 6 rue Jules Horowitz, BP220, F-38043 Grenoble Cedex, France.
Texier M; Aix Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, 13397 Marseille, France.
Mocuta C; Aix Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, 13397 Marseille, France.
Guichet C; Synchrotron SOLEIL, l'Orme des Merisiers, Saint-Aubin-BP 48, 91192 Gif-sur-Yvette Cedex, France.
Thomas O; Aix Marseille Université, CNRS, Université de Toulon, IM2NP UMR 7334, 13397 Marseille, France.

Phys Rev Lett ; 115(26): 266101, 2015 Dec 31.

Article en En | MEDLINE | ID: mdl-26765008

RESUMEN

Texture evolution is an important issue in materials and nanosciences. Understanding it is fundamental for controlling the final orientation, which in fine controls the desired properties of nanodevices. Here, we reveal the formation of a peculiar texture during the silicidation of nanoscale Pd thin films. We demonstrate that the crystallographic relationship observed between the silicide and the Si(001) substrate, named gyroaxy, evolves continuously and collectively during silicidation. This continuous rotation of the nanosized grains over a wide angular range is proposed to be associated with a diffusional mechanism.

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2015 Tipo del documento: Article País de afiliación: Francia Pais de publicación: Estados Unidos

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