Wetting films of aqueous solutions of Silwet L-77 on a hydrophobic surface.

Ivanova, N A; Kovalchuk, N M; Sobolev, V D; Starov, V M

Ivanova, N A; Kovalchuk, N M; Sobolev, V D; Starov, V M.

Afiliación

Ivanova NA; Institute of Technical Physics, Tyumen State University, Semakova 10, 625003 Russia.
Kovalchuk NM; Institute of Biocolloid Chemistry, Blvd. Akad. Vernadskogo 42, Kiev, Ukraine.
Sobolev VD; Institute of Physical Chemistry and Electrochemistry, Leninsky Prosp. 31, Moscow, Russia.
Starov VM; Chemical Engineering Department, Loughborough University, Loughborough, LE11 3TU, UK. V.M.Starov@lboro.ac.uk.

Soft Matter ; 12(1): 26-30, 2016 Jan 07.

Article en En | MEDLINE | ID: mdl-26451895

RESUMEN

The formation of wetting films of aqueous solutions of Silwet L-77 on hydrophobic substrates takes place only at concentrations above the critical aggregation concentration (CAC). At concentrations above the critical wetting concentration (CWC) a new phenomenon was found: the formation of multilayered spots of thicker films in the wetting film of aqueous solutions of Silwet L-77 on hydrophobic surfaces. An expansion of the thicker spots within the film and the formation of "channels" between the spots and the edge of the film led to a continuous shrinkage of the wetting film and its disappearance in the end. We suggested that the multiple thicker films originate from the multilayer structuring of trisiloxane bilayers within the wetting film.

Asunto(s)

Compuestos de Organosilicio/química; Humectabilidad; Siloxanos/química

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Asunto principal: Humectabilidad / Compuestos de Organosilicio Idioma: En Revista: Soft Matter Año: 2016 Tipo del documento: Article Pais de publicación: Reino Unido

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