Continuum models of focused electron beam induced processing.

Toth, Milos; Lobo, Charlene; Friedli, Vinzenz; Szkudlarek, Aleksandra; Utke, Ivo

Toth, Milos; Lobo, Charlene; Friedli, Vinzenz; Szkudlarek, Aleksandra; Utke, Ivo.

Afiliación

Toth M; School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
Lobo C; School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
Friedli V; Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.
Szkudlarek A; Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland ; AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 K
Utke I; Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland.

Beilstein J Nanotechnol ; 6: 1518-40, 2015.

Article en En | MEDLINE | ID: mdl-26425405

Palabras clave

continuum model; deposition; electron beam processing; etching; gas injection system

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Beilstein J Nanotechnol Año: 2015 Tipo del documento: Article País de afiliación: Australia Pais de publicación: Alemania

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