Interfacial phenomena at a surface of partially silylated nanosilica.

Gun'ko, V M; Turov, V V; Myronyuk, I F; Goncharuk, O V; Pakhlov, E M; Bezruka, N A; Skwarek, E; Janusz, W; Blitz, J P

Gun'ko, V M; Turov, V V; Myronyuk, I F; Goncharuk, O V; Pakhlov, E M; Bezruka, N A; Skwarek, E; Janusz, W; Blitz, J P.

Afiliación

Gun'ko VM; Chuiko Institute of Surface Chemistry, 17 General Naumov Street, 03164 Kyiv, Ukraine. Electronic address: vlad_gunko@ukr.net.
Turov VV; Chuiko Institute of Surface Chemistry, 17 General Naumov Street, 03164 Kyiv, Ukraine.
Myronyuk IF; Vasyl Stefanyk Precarpathian National University, 57 Shevchenko Street, 76018 Ivano-Frankovsk, Ukraine.
Goncharuk OV; Chuiko Institute of Surface Chemistry, 17 General Naumov Street, 03164 Kyiv, Ukraine.
Pakhlov EM; Chuiko Institute of Surface Chemistry, 17 General Naumov Street, 03164 Kyiv, Ukraine.
Bezruka NA; Vasyl Stefanyk Precarpathian National University, 57 Shevchenko Street, 76018 Ivano-Frankovsk, Ukraine.
Skwarek E; Faculty of Chemistry, Maria Curie-Sklodowska University, 20-031 Lublin, Poland.
Janusz W; Faculty of Chemistry, Maria Curie-Sklodowska University, 20-031 Lublin, Poland.
Blitz JP; Eastern Illinois University, Department of Chemistry, Charleston, IL 61920, USA.

J Colloid Interface Sci ; 434: 28-39, 2014 Nov 15.

Article en En | MEDLINE | ID: mdl-25168580

Palabras clave

Dispersion medium effects; Partially silylated nanosilica; Waterhydrogen co-adsorption; Watermethane co-adsorption

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Colloid Interface Sci Año: 2014 Tipo del documento: Article Pais de publicación: Estados Unidos

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