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Impact of geometry on the performance of memristive nanodevices.
Xia, Qiangfei; Pickett, Matthew D; Yang, J Joshua; Zhang, M-X; Borghetti, Julien; Li, Xuema; Wu, Wei; Medeiros-Ribeiro, Gilberto; Williams, R Stanley.
Afiliación
  • Xia Q; Hewlett-Packard Laboratories, Palo Alto, CA 94304, USA. qxia@ecs.umass.edu
Nanotechnology ; 22(25): 254026, 2011 Jun 24.
Article en En | MEDLINE | ID: mdl-21572201
We examined the influence of memristor geometry on switching endurance by comparing ribbed and planar TiO(2)-based cross-point devices with 50 nm × 50 nm lateral dimensions. We observed that planar devices exhibited a factor of over four improvement in median endurance value over ribbed structures for otherwise identical structures. Our simulations indicated that the corners in the upper wires of the ribbed devices experienced higher current density and more heating during device forming and switching, and hence a shorter life time.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2011 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Reino Unido

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2011 Tipo del documento: Article País de afiliación: Estados Unidos Pais de publicación: Reino Unido