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Note: Quantitative (artifact-free) surface potential measurements using Kelvin force microscopy.
Mélin, T; Barbet, S; Diesinger, H; Théron, D; Deresmes, D.
Afiliación
  • Mélin T; Institute of Electronics, Microelectronics and Nanotechnology, CNRS-UMR 8520, Avenue Poincaré, BP 60069, 59652 Villeneuve d'Ascq Cedex, France. thierry.melin@isen.iemn.univ-lille1.fr
Rev Sci Instrum ; 82(3): 036101, 2011 Mar.
Article en En | MEDLINE | ID: mdl-21456803
The measurement of local surface potentials by Kelvin force microscopy (KFM) can be sensitive to external perturbations which lead to artifacts such as strong dependences of experimental results (typically in a ∼1 V range) with KFM internal parameters (cantilever excitation frequency and/or the projection phase of the KFM feedback-loop). We analyze and demonstrate a correction of such effects on a KFM implementation in ambient air. Artifact-free KFM measurements, i.e., truly quantitative surface potential measurements, are obtained with a ∼30 mV accuracy.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Rev Sci Instrum Año: 2011 Tipo del documento: Article País de afiliación: Francia Pais de publicación: Estados Unidos

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Rev Sci Instrum Año: 2011 Tipo del documento: Article País de afiliación: Francia Pais de publicación: Estados Unidos