Extreme ultraviolet reflectance degradation of aluminum and silicon from surface oxidation.
Appl Opt
; 27(8): 1503-7, 1988 Apr 15.
Article
en En
| MEDLINE
| ID: mdl-20531605
We have performed in situ oxide contamination and XUV reflectance vs angle of incidence studies on fresh aluminum and silicon films evaporated in an ultrahigh vacuum system (base pressure 2 x 10(-10)Torr). Our ellipsometric measurements indicate that a surface monolayer of oxide forms on aluminum (1 h at 2 x10(-8) Torr oxygen) and silicon (1 h at 10-(7) -Torr oxygen). The monolayer formation time is inversely proportional to oxygen pressure. Our reflectance vs angle of incidence measurements at 58.4-nm wavelength indicate that unoxidized aluminum and silicon coatings can be used as multifacet retroreflectors with net retroreflectances in excess of 75% for aluminum and 50% for silicon.
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1
Colección:
01-internacional
Base de datos:
MEDLINE
Tipo de estudio:
Incidence_studies
/
Risk_factors_studies
Idioma:
En
Revista:
Appl Opt
Año:
1988
Tipo del documento:
Article
Pais de publicación:
Estados Unidos