A new route to the production and nanoscale patterning of highly smooth, ultrathin zirconium oxide films.
ACS Nano
; 2(4): 643-50, 2008 Apr.
Article
en En
| MEDLINE
| ID: mdl-19206594
Metal-stabilized bilayers, prepared by the self-assembly of octadecyltrichorosilane on an oxidized silicon surface followed by the Langmuir-Blodgett deposition of a monolayer of octadecylphosphonic acid, have been used to generate 1.6 nanometer thick, highly uniform, zirconium oxide films following annealing. Patterning of the thin films on the nanometre scale was achieved using nanodisplacement methodology, by careful control of an atomic force microscope (AFM) probe, which allowed the selective removal of the upper leaflet of the bilayer.
Texto completo:
1
Colección:
01-internacional
Base de datos:
MEDLINE
Asunto principal:
Circonio
/
Cristalización
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Nanotecnología
/
Nanoestructuras
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Organofosfonatos
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Membranas Artificiales
Idioma:
En
Revista:
ACS Nano
Año:
2008
Tipo del documento:
Article
Pais de publicación:
Estados Unidos