Competitive growth model involving random deposition and random deposition with surface relaxation.
Phys Rev E Stat Nonlin Soft Matter Phys
; 63(6 Pt 2): 066132, 2001 Jun.
Article
en En
| MEDLINE
| ID: mdl-11415198
A deposition model that considers a mixture of random deposition with surface relaxation and a pure random deposition is proposed and studied. As the system evolves, random deposition with surface relaxation (pure random deposition) take place with probability p and (1-p), respectively. The discrete (microscopic) approach to the model is studied by means of extensive numerical simulations, while continuous equations are used in order to investigate the mesoscopic properties of the model. A dynamic scaling ansatz for the interface width W(L,t,p) as a function of the lattice side L, the time t and p is formulated and tested. Three exponents, which can be linked to the standard growth exponent of random deposition with surface relaxation by means of a scaling relation, are identified. In the continuous limit, the model can be well described by means of a phenomenological stochastic growth equation with a p-dependent effective surface tension.
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Colección:
01-internacional
Base de datos:
MEDLINE
Tipo de estudio:
Clinical_trials
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Qualitative_research
Idioma:
En
Revista:
Phys Rev E Stat Nonlin Soft Matter Phys
Asunto de la revista:
BIOFISICA
/
FISIOLOGIA
Año:
2001
Tipo del documento:
Article
País de afiliación:
Argentina
Pais de publicación:
Estados Unidos