RESUMO
In this paper we explore the application of low-loss multimode anti-resonant hollow-core fiber (MM-AR-HCF) in the delivery of nanosecond laser pulses at 1â µm wavelength. MM-AR-HCF with large core offers a rich content of low-loss higher-order modes which plays a key role in the efficient coupling and transmission of high-power laser of low beam quality. In the experiment, laser pulses of an average pulse energy of 21.8 mJ with 14.6â ns pulse width (corresponding a peak power of 1.49â MW) are transmitted through MM-AR-HCF of 9.8 m length without damage. 85% transmission efficiency is achieved where the incident laser beam suffers a low beam quality with M2 x and M2 y of 2.18 and 1.99 respectively. Laser-induced damage threshold (LIDT) of MM-AR-HCF was measured to be 22.6 mJ for 85% transmission efficiency, which is 7 times higher than that for a multimode silica optical fiber with a large core of 200â µm.
RESUMO
Two-dimensional (2D) materials own unique band structures and excellent optoelectronic properties and have attracted wide attention in photonics. Tin disulfide (SnS2), a member of group IV-VI transition metal dichalcogenides (TMDs), possesses good environmental optimization, oxidation resistance, and thermal stability, making it more competitive in application. By using the intensity-dependent transmission experiment, the saturable absorption properties of the SnS2 nanosheet nearly at 3 µm waveband were characterized by a high modulation depth of 32.26%. Therefore, a few-layer SnS2 was used as a saturable absorber (SA) for a bulk Er:SrF2 laser to research its optical properties. When the average output power was 140 mW, the passively Q-switched laser achieved the shortest pulse width at 480 ns, the optimal single pulse energy at 3.78 µJ, and the highest peak power at 7.88 W. The results of the passively Q-switched laser revealed that few-layer SnS2 had an admirable non-linear optical response at near 3 µm mid-infrared solid-state laser.
RESUMO
Object-space model optimization (OSMO) has been proven to be a simple and high-accuracy approach for additive manufacturing of tomographic reconstructions compared with other approaches. In this paper, an improved OSMO algorithm is proposed in the context of OSMO. In addition to the two model optimization steps in each iteration of OSMO, another two steps are introduced: one step enhances the target regions' in-part edges of the intermediate model, and the other step weakens the target regions' out-of-part edges of the intermediate model to further improve the reconstruction accuracy of the target boundary. Accordingly, a new quality metric for volumetric printing, named 'Edge Error', is defined. Finally, reconstructions on diverse exemplary geometries show that all the quality metrics, such as VER, PW, IPDR, and Edge Error, of the new algorithm are significantly improved; thus, this improved OSMO approach achieves better performance in convergence and accuracy compared with OSMO.
RESUMO
Semiconductor lasers have developed rapidly with the steady growth of the global laser market. The use of semiconductor laser diodes is currently considered to be the most advanced option for achieving the optimal combination of efficiency, energy consumption, and cost parameters of high-power solid-state and fiber lasers. In this work, an approach for optical mode engineering in planar waveguides is investigated. The approach referred to as Coupled Large Optical Cavity (CLOC) is based on the resonant optical coupling between waveguides and allows the selection of high-order modes. The state-of-art of the CLOC operation is reviewed and discussed. We apply the CLOC concept in our waveguide design strategy. The results in both numerical simulation and experiment show that the CLOC approach can be considered a simple and cost-efficient solution for improving diode laser performance.
RESUMO
Traditional planar diffractive optical elements (DOEs) are challenged in imaging systems due to diffraction efficiency and chromatic dispersion. In this paper, we have designed a microfluidic diffractive optical element (MFDOE), which is processed by digital micromirror device (DMD) maskless lithography (DMDML) assisted femtosecond laser direct writing (FsLDW). MFDOE is a combination of photoresist-based multi-layer harmonic diffraction surface and liquid, realizing diffraction efficiency of more than 90% in the visible band. And it shows achromatic characteristics in the two bands of 469 nm (±20 nm) and 625 nm (±20 nm). These results show that MFDOE has good imaging performance.