RESUMEN

Abstract Depending on the intensity and ecological successional classification of plants, light availability can become an unfavorable condition for producing high-quality seedlings. We hypothesized that applying silicon sources might contribute to inducing tolerance to different shading levels for Peltophorum dubium (Spreng.) Taub. seedlings. Two independent experiments were developed: I) the application of five doses of silicon oxide (SiO2: 0.0; 1.0; 2.0; 4.0; and 6.0 g L-1); and II) the application of five doses of potassium silicate (K2SiO3: 0.0; 5.0; 10.0; 15.0; and 20.0 mL L-1 of water). Both were associated with three shading levels: 0% (direct sunlight), 30%, and 50%. In experiment I, we observed that seedlings were more responsive to shading levels and had little influence from foliar application of SiO2, with higher growth, biomass, and quality values when grown under direct sunlight (0% shading). In experiment II, the foliar application of 20.0 mL L-1 of K2SiO3 contributed to greater heights under 0% and 30% shading. Meanwhile, under 50% shading, the dose of 5.0 K2SiO3 favored the species' growth. The application of K2SiO3 favored the increase in the dry mass of the aerial part (DMAP). The highest biomass production and seedling quality occurred under 0% and 30% shading. The 50% shaded environment was most unfavorable to the growth and quality of P. dubium seedlings. Even though the seedlings were not very responsive to silicon sources, K2SiO3 provided a greater response than SiO2. High-quality seedling production is favored when the seedlings are grown under direct sunlight (0% shading).

Resumo A disponibilidade luminosade dependendo da intensidade e a classificação ecológica sucessional das plantas pode se tornar uma condição desfavorável a produção de mudas de alta qualidade. Hipotetizamos que a aplicação de fontes de silício pode contribuir na indução da tolerância a diferentes níveis de sombreamento para mudas de Peltophorum dubium (Spreng.) Taub. Foram desenvolvimentos dois experimentos independentes: I) aplicação de cinco doses de óxido de silício (SiO2): 0,0; 1,0; 2,0; 4,0 e 6,0 g L-1) e II) aplicação de cinco doses de silicato de potássio (K2SiO3): 0,0; 5,0; 10,0; 15,0 e 20,0 mL L-1 de água, ambos associados a três níveis de sombreamento: 0% (pleno sol), 30% e 50%. No experimento I, observamos que as mudas foram mais responsivas aos níveis de sombreamento e pouco influenciadas pela aplicação foliar de SiO2, com maiores valores de crescimento, biomassa e qualidade quando produzidas sob pleno sol (0% sombreamento). No experimento II, a aplicação foliar de 20,0 mL L-1 de K2SiO3 contribuiu em maiores alturas sob 0% e 30%, enquanto que sob 50% de sombreamento a dose de 5,0 K2SiO3 favoreceu o crescimento da espécie. A aplicação de K2SiO3 favoreceu no incremento de massa seca da parte aérea. As maiores produções de biomassa e qualidade das mudas foram sob 0% e 30% de sombreamento. O ambiente com 50% de sombreamento foi mais desfavorável ao crescimento e qualidade das mudas de P. dubium. Embora as mudas sejam pouco responsivas as fontes de silício, o K2SiO3 contrubuiu mais do que o SiO2. A produção de mudas de alta qualidade é favorecida quando cultivadas sob pleno sol (0% de sombreamento).

RESUMEN

Desalinization of seawater can be achieved by membrane distillation techniques (MD). In MD, the membranes should be resistant to fouling, robust for extended operating time, and preferably provide a superhydrophobic surface. In this work, we report the preparation and characterization of a robust and superhydrophobic polyvinylidene fluoride membrane containing fluoroalkyl-capped CuONPs (CuONPs@CF) in the inner and fluorinated capped silicon oxide nanoparticles (SiO2NPs@CF) on its surface. SiO2NPs@CF with a mean diameter of 225 ± 20 nm were prepared by the sol method using 1H,1H,2H,2H-perfluorodecyltriethoxysilane as a capping agent. Surface modification of the membrane was carried out by spraying SiO2NPs@CF (5% wt.) dispersed in a mixture of dimethyl formamide (DMF) and ethanol (EtOH) at different DMF/EtOH % v/v ratios (0, 5, 10, 20, and 50). While ethanol dispersed the nanoparticles in the spraying solution, DMF dissolved the PVDF on the surface and retained the sprayed nanoparticles. According to SEM micrographs and water contact angle measurements, the best results were achieved by depositing the nanoparticles at 10% v/v of DMF/EtOH. Under these conditions, a SiO2NPs covered surface was observed with a water contact angle of 168.5°. The water contact angle was retained after the sonication of the membrane, indicating that the modification was successfully achieved. The membrane with SiO2NPs@CF showed a flux of 14.3 kg(m2·h)-1, 3.4 times higher than the unmodified version. The method presented herein avoids the complicated modification procedure offered by chemical step modification and, due to its simplicity, could be scalable to a commercial membrane.