RESUMEN
This paper introduces a cost-effective, high-performance approach to achieving wafer level vacuum packaging (WLVP) for MEMS-based uncooled infrared sensors. Reliable and hermetic packages for MEMS devices are achieved using a cap wafer that is formed using two silicon wafers, where one wafer has precise grating/moth-eye structures on both sides of a double-sided polished wafer for improved transmission of over 80% in the long-wave infrared (LWIR) wavelength region without the need for an AR coating, while the other wafer is used to form a cavity. The two wafers are bonded using Au-In transient liquid phase (TLP) bonding at low temperature to form the cap wafer, which is then bondelectrical and Electronics d to the sensor wafer using glass frit bonding at high temperature to activate the getter inside the cavity region. The bond quality is assessed using three methods, including He-leak tests, cap deflection, and Pirani vacuum gauges. Hermeticity is confirmed through He-leak tests according to MIL-STD 883, yielding values as low as 0.1 × 10-9 atm·cc/s. The average shear strength is measured as 23.38 MPa. The package pressure varies from 133-533 Pa without the getter usage to as low as 0.13 Pa with the getter usage.
RESUMEN
Half-bridge silicon strain gauges are widely used in the fabrication of diaphragm-type high-pressure sensors, but in some applications, they suffer from low output sensitivity because of mounting position constraints. Through a special design and fabrication approach, a new half-bridge silicon strain gauge comprising one arc gauge responding to tangential strain and another linear gauge measuring radial strain was developed using Silicon-on-Glass (SiOG) substrate technology. The tangential gauge consists of grid patterns, such as the reciprocating arc of silicon piezoresistors on a thin glass substrate. When two half-bridges are connected to form a full bridge with arc-shaped gauges that respond to tangential strain, they have the advantage of providing much higher output sensitivity than a conventional half-bridge. Pressure sensors tested under pressure ranging from 0 to 50 bar at five different temperatures indicate a linear output with a typical sensitivity of approximately 16 mV/V/bar, a maximum zero shift of 0.05% FS, and a span shift of 0.03% FS. The higher output level of pressure sensing gauges will provide greater signal strength, thus maintaining a better signal-to-noise ratio than conventional pressure sensors. The offset and span shift curves are quite linear across the operating temperature range, giving the end user the advantage of using very simple algorithms for temperature compensation of offset and span shift.
RESUMEN
Currently, silicon-strain-gauge-based diaphragm pressure sensors use four single-gauge chips for high-output sensitivity. However, the four-single-gauge configuration increases the number of glass frit bonds and the number of aluminum wire bonds, reducing the long-term stability, reliability, and yield of the diaphragm pressure sensor. In this study, a new design of general-purpose silicon strain gauges was developed to improve the sensor output voltage while reducing the number of bonds. The new gauges consist grid patterns with a reciprocating arc of silicon piezoresistors on a thin glass backing. The gauges make handling easier in the bonding process due to the use of thin glass for the gauge backing. The pressure sensors were tested under pressure ranging from 0 to 50 bar at five different temperatures, with a linear output with a typical sensitivity of approximately 16 mV/V/bar and an offset shift of -6 mV to 2 mV. The new approach also opens the possibility to extend arc strain gauges to half-bridge and full-bridge configurations to further reduce the number of glass frit and Al wire bonds in the diaphragm pressure sensor.
RESUMEN
A thermo-mechanical wafer-to-wafer bonding process is studied through experiments on the glass frit material and thermo-mechanical numerical simulations to evaluate the effect of the residual stresses on the wafer warpage. To experimentally characterize the material, confocal laser profilometry and scanning electron microscopy for surface observation, energy dispersive X-ray spectroscopy for microstructural investigation, and nanoindentation and die shear tests for the evaluation of mechanical properties are used. An average effective Young's modulus of 86.5 ± 9.5 GPa, a Poisson's ratio of 0.19 ± 0.02, and a hardness of 5.26 ± 0.8 GPa were measured through nanoindentation for the glass frit material. The lowest nominal shear strength ranged 1.13 ÷ 1.58 MPa in the strain rate interval to 0.33 ÷ 4.99 × 10-3 s-1. To validate the thermo-mechanical model, numerical results are compared with experimental measurements of the out-of-plane displacements at the wafer surface (i.e., warpage), showing acceptable agreement.
RESUMEN
Glass frit bonding is a widely used technology to cap and seal micro-electromechanical systems on the wafer level using a low melting point glass. Screen printing is the main method to apply glass frit paste on wafers. Screen printing of glass frit paste is usually performed on less sensitive, less critical wafers, normally the capping wafer, because screen printing is a rough process involving the mechanical contact of the screen printing mesh and the wafer. However, for some applications in which contactless patterning of glass frit materials on the device wafers are preferred (e.g., 3D topographies, micro-lens and optics integration) jet dispensing could be a promising approach. Consequently, in this study, wafer-level jetting of glass frit materials on silicon wafers was proposed and investigated. The jetting parameters such as jetting distance, power and temperature were optimized for a glass frit paste. Additionally, the effect of jetted pitch size on the bond-line thickness was assessed. The wafers with jetted glass frit pastes were conclusively bonded in low vacuum and characterized. As a single-step (non-contact) additive approach, the jet printing of glass frit was revealed to be a straightforward, cost-effective and flexible approach with several implications for hermetic packaging.
RESUMEN
A geometrical modification on silicon wafers before the bonding process, aimed to decrease (1) the residual stress caused by glass frit bonding, is proposed. Finite element modeling showed that (2) by introducing this modification, the wafer out-of-plane deflection was decreased by 34%. Moreover, (3) fabricated wafers with the proposed geometrical feature demonstrated an improvement for the (4) warpage with respect to the plain wafers. A benefit for curvature variation and overall shape of the (5) bonded wafers was also observed.