RESUMEN
Metal halide perovskite single crystals are emerging candidates for X-ray detection, however, it is challenging for growth of thickness-controlled single-crystal wafer on commercial backplanes, limiting their practical imaging application. Herein, integration of micrometer-thick methylammonium lead triiodide (MAPbI3) single-crystal wafer on indium tin oxide (ITO) substrates by methylamine (MA)-induced interface recrystallization is reported. Through selection of hole transport material with rich functional group, intimate interface contact with low trap density can be achieved, leading to superior carrier transport properties and homogeneous photoresponse. The as-fabricated X-ray detectors exhibit high sensitivity of 1.4 × 104 µC Gyair -1 cm-2 and low detection limit of 177 nGyair s-1, which are comparable to previous reports based on free-standing MAPbI3 bulk crystals. This work provides a feasible strategy for constructing substrate-integrated single-crystal perovskite wafers with controlled thickness, which may promote practical imaging application of perovskite X-ray detectors.
RESUMEN
Perovskite single crystals and polycrystalline films have complementary merits and deficiencies in X-ray detection and imaging. Herein, we report preparation of dense and smooth perovskite microcrystalline films with both merits of single crystals and polycrystalline films through polycrystal-induced growth and hot-pressing treatment (HPT). Utilizing polycrystalline films as seeds, multi-inch-sized microcrystalline films can be in situ grown on diverse substrates with maximum grain size reaching 100â µm, which endows the microcrystalline films with comparable carrier mobility-lifetime (µτ) product as single crystals. As a result, self-powered X-ray detectors with impressive sensitivity of 6.1×104 â µC Gyair -1 cm-2 and low detection limit of 1.5â nGyair s-1 are achieved, leading to high-contrast X-ray imaging at an ultra-low dose rate of 67â nGyair s-1 . Combining with the fast response speed (186â µs), this work may contribute to the development of perovskite-based low-dose X-ray imaging.
RESUMEN
Metal halide perovskite single crystals are a promising candidate for X-ray detection due to their large atomic number and high carrier mobility and lifetime. However, it is still challenging to grow large-area and thin single crystals directly onto substrates to meet real-world applications. In this work, millimeter-thick and inch-sized methylammonium lead tribromide (MAPbBr3) single-crystal wafers are grown directly on indium tin oxide (ITO) substrates through controlling the distance between solution surface and substrates. The single-crystal wafers are polished and treated with O3 to achieve smooth surface, lower trap density, and better electrical properties. X-ray detectors with a high sensitivity of 632 µC Gyair -1 cm-2 under -5 V and 525 µC Gyair -1 cm-2 under -1 V bias can be achieved. This work provides an effective way to fabricate substrate-integrated, large-area, and thickness-controlled perovskite single-crystal X-ray detectors, which is instructive for developing imaging application based on perovskite single crystals.