RESUMEN
Wide bandgap metal fluorides are the materials of choice for optical coating applications at 193 nm. Low loss and environmentally stable optics requires a mitigating fluoride film structure on a nanometer scale. To understand the growth mechanism of fluoride materials, GdF(3) films grown on CaF(2) (111) and SiO(2) substrates were investigated. Film inhomogeneity and surface roughness were modeled by fitting ellipsometric data with an effective medium approximation, indicating a correlation between film inhomogeneity and surface roughness. The modeled surface roughness was compared with the atomic force microscope measurement. Film inhomogeneity was correlated to the cone-shaped columnar structure revealed by cross-sectional images from a scanning electron microscope. The film crystalline structure was determined by x-ray diffraction measurement, suggesting a different growth mechanism of GdF(3) films on crystalline and amorphous substrates.
RESUMEN
Ion- and plasma-assisted deposition has been extensively used for the fabrication of high-performance optical films with dense and smooth microstructures that are essential for applications such as low-loss and environmentally stable optics. SiO(2) is a well-known amorphous material suitable for energetic deposition. SiO(2) single layers and SiO(2)-based single-cavity narrow-bandpass filters were prepared by plasma-ion-assisted deposition. The refractive index and film thickness were determined by variable-angle spectroscopic ellipsometry. The high compressive stress of the densified film was correlated to increased packing density. The center wavelength shift of the narrow-bandpass filters as a function of sample-temperature as well as high-temperature annealing was determined via spectral transmission measurement. Structural relaxation of the densified SiO(2) films was observed from the variation of the refractive index and physical thickness for the single layers and the center wavelength shift for the narrow-bandpass filters, suggesting elastic and plastic deformation of the densified films corresponding to a reversible and an irreversible center wavelength shift, respectively.
RESUMEN
HfO(2) is a well-known high-refractive-index material for optical interference coatings from the infrared down to the ultraviolet (UV). Dense, homogeneous, and stoichiometric HfO(2) film is critical for low-loss UV optics where the spectral region is close to its fundamental absorption edge. We prepare HfO(2) films by plasma-ion-assisted deposition with various amounts of plasma-ion momentum transfer. The correlation between the HfO(2) film structure and the optical properties are evaluated by a variable-angle spectroscopic ellipsometry, indicating inhomogeneous to homogeneous to inhomogeneous film structural evolution with increasing momentum transfer during deposition. The HfO(2) film inhomogeneity, surface roughness, and crystal phase are confirmed by scanning electron microscopy cross-sectional, atomic force microscopy, and x-ray diffraction measurements. The results suggest that the HfO(2) film structural evolution corresponds to crystal phase transition from weak monocline amorphous to strong monocline depending on the amount of plasma-ion momentum transfer during film deposition.
RESUMEN
As excimer lasers extend to deep-ultraviolet and vacuum-ultraviolet wavelengths at 193 and 157 nm, optical coatings experience the challenge of eliminating possible environmental contamination, reducing scattering loss, and increasing laser irradiation durability. Wide bandgap metal fluorides become the materials of choice for the laser optics applications. To understand the optical properties of nanostructure fluoride films, thin GdF(3) films grown on CaF(2) (111) substrates were evaluated by variable angle spectroscopic ellipsometry. An effective medium approximation model was used to determine both the film porosity and the surface roughness. Structural evolution of the GdF(3) film was revealed with improved ellipsometric modeling, suggesting the existence of multilayer structure, a densified bottom layer, middle layers with increasing porosity, and a rough surface. The nanostructure of the film and the surface roughness were confirmed by atomic force microscopy. The attraction of the nanostructure to environmental contamination was experimentally demonstrated.
RESUMEN
Metal oxide layers produced by plasma ion-assisted deposition are extensively used for complex optical coatings due to the availability of materials, the high packing density of films, and the smooth surfaces. Stringent optical surface figure specifications necessary for both laser optics and precision optics require film stress to be well-controlled and surface deformation to be corrected or compensated. SiO(2)- based single-cavity UV narrow-bandpass filters were prepared by plasma ion-assisted deposition. The correlation between film stress, refractive index, deposition parameters, and postdeposition annealing was established. The film stress was calculated based on interferometric surface deformation. The refractive index and film thickness were determined by means of variable angle spectroscopic ellipsometry. The center wavelength of the filters was obtained through spectral transmission measurement. The results suggest that the wavefront distortion of the multilayer coatings is dominated by the compressive stress of the SiO(2) layers and can be controlled and corrected by the amount of plasma ion momentum transfer, substrate temperature, postdeposition annealing, and stress compensation via backside SiO(2) coating. Based on the understanding of the mechanical and optical properties, the wavefront correction technique enables us to satisfy stringent surface figure specifications.