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1.
Beilstein J Nanotechnol ; 14: 1059-1067, 2023.
Artículo en Inglés | MEDLINE | ID: mdl-38025201

RESUMEN

In this work, a silicon photodiode integrated with a piezoelectric membrane is studied by Kelvin probe force microscopy (KPFM) under modulated illumination. Time-dependent KPFM enables simultaneous quantification of the surface photovoltage generated by the photodiode as well as the resulting mechanical oscillation of the piezoelectric membrane with vertical atomic resolution in real-time. This technique offers the opportunity to measure concurrently the optoelectronic and mechanical response of the device at the nanoscale. Furthermore, time-dependent atomic force microscopy (AFM) was employed to spatially map voltage-induced oscillation of various sizes of piezoelectric membranes without the photodiode to investigate their position- and size-dependent displacement.

2.
Opt Express ; 27(8): A269-A279, 2019 Apr 15.
Artículo en Inglés | MEDLINE | ID: mdl-31052881

RESUMEN

A novel back-contacted solar cell based on a submicron copper indium gallium (di)selenide (CIGS) absorber is proposed and optically investigated. First, charge carrier collection feasibility is studied by band diagram analysis. Then, two back-contacted configurations are suggested and optimized for maximum current production. The results are compared with a reference front/back-contacted CIGS solar cell with a 750-nm-thick absorber. Current density production of 38.84 mA/cm2 is predicted according to our simulations for a realistic front-side texturing. This shows more than 38% improvement in optical performance compared to the reference cell and only 7.7% deviation from the theoretical Green absorption benchmark.

3.
Opt Express ; 26(2): A39-A53, 2018 Jan 22.
Artículo en Inglés | MEDLINE | ID: mdl-29402054

RESUMEN

A 3-D optical modelling was calibrated to calculate the light absorption and the total reflection of fabricated CIGS solar cells. Absorption losses at molybdenum (Mo) / CIGS interface were explained in terms of plasmonic waves. To quench these losses, we assumed the insertion of a lossless dielectric spacer between Mo and CIGS, whose optical properties were varied. We show that such a spacer with low refractive index and proper thickness can significantly reduce absorption in Mo in the long wavelength regime and improve the device's rear reflectance, thus leading to enhanced light absorption in the CIGS layer. Therefore, we optimized a realistic two-layer MgF2 / Al2O3 dielectric spacer to exploit (i) the passivation properties of ultra-thin Al2O3 on the CIGS side for potential high open-circuit voltage and (ii) the low refractive index of MgF2 on the Mo side to reduce its optical losses. Combining our realistic spacer with optically-optimized point contacts increases the implied photocurrent density of a 750 nm-thick CIGS layer by 10% for the wavelengths between 700 and 1150 nm with respect to the reference cell. The elimination of plasmonic resonances in the new structure leads to a higher electric field magnitude at the bottom of CIGS layer and justifies the improved optical performance.

4.
Opt Express ; 24(6): A708-19, 2016 Mar 21.
Artículo en Inglés | MEDLINE | ID: mdl-27136888

RESUMEN

The optical analysis of optically-textured and electrically-flat ultra-thin crystalline silicon (c-Si) slabs is presented. These slabs were endowed with decoupled front titanium-dioxide (TiO2) / back silicon-dioxide (SiO2) dielectric textures and were studied as function of two types of back reflectors: standard silver (Ag) and dielectric modulated distributed Bragg reflector (MDBR). The optical performance of such systems was compared to that of state-of-the-art flat c-Si slabs endowed with so-called front Mie resonators and to those of similar optical systems still endowed with the same back reflectors and decoupled front/back texturing but based on textured c-Si and dielectric coatings (front TiO2 and back SiO2). Our optimized front dielectric textured design on 2-µm thick flat c-Si slab with MDBR resulted in more photo-generated current density in c-Si with respect to the same optical system but featuring state-of-the-art Mie resonators ( + 6.4%), mainly due to an improved light in-coupling between 400 and 700 nm and light scattering between 700 and 1050 nm. On the other hand, the adoption of textured dielectric layers resulted in less photo-generated current density in c-Si up to -20.6% with respect to textured c-Si, depending on the type of back reflector taken into account.

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